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METREX SCIENTIFIC INSTRUMENTS PVT. LTD.
GST : 07AAACM0005C1ZF

Chemical Vapour Deposition System (CVD)

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Chemical Vapour Deposition System (CVD)

Chemical Vapour Deposition System (CVD) Specification

Temperature Range
Ambient to 1200C

Voltage
240 Volt (v)

Model No
CVD-8854996

Frequency
50/60 Hz

Feature
High Precision Temperature Control, Uniform Deposition, Safety Interlocks

Power Source
Electric

Measurement Range
Dependent on Sensor Configuration

Color
White And Blue

Core Components
Reaction Chamber, Gas Flow System, Temperature Controller, Vacuum Pump, Power Supply

Automation Grade
Semi-automatic / Automatic (on request)

Accuracy
1C

Usage
Industrial

Capacity
Custom build various chamber sizes available

Material
MS

Equipment Materials
Mild Steel (MS), Quartz Glass, Stainless Steel (for inner chamber)

Type
Chemical Vapour Deposition System (CVD)

Display Type
Digital Display

Dimension (L*W*H)
1200 x 600 x 750 mm (approximate)

Weight
Approx. 100 kg (varies based on configuration)

Chemical Vapour Deposition System (CVD) Trade Information

Minimum Order Quantity
1 Unit

Delivery Time
7 Days

About Chemical Vapour Deposition System (CVD)

Jump on the peerless Chemical Vapour Deposition System (CVD)your prime solution for advanced material engineering. Imposing in build and performance, this equipment utilises an imposing array of features such as a microprocessor-based PID controller, high-precision temperature regulation (ambient to 1200C), and robust safety interlocks. Compatible with various gases (Ar, N2, H2, O2, CH4, SiH4) and boasting a powder-coated surface finish, this system promises uniform deposition and superior process control. Offer savings on custom chamber configurations, installation support, and flexible automation. Make prime advances in industrial and research settings with this precision CVD system.

Application Places and Site Utilisation of the CVD System

The Chemical Vapour Deposition System (CVD) is widely deployed in semiconductor fabrication facilities, research laboratories, and industrial production units. Its specific usage spans thin film deposition, nanomaterial synthesis, and material development for electronics. At these sites, it facilitates high-accuracy coatings essential for device manufacturing and research & development, making it an ideal choice for institutions and commercial entities aiming for excellence in materials science and engineering.

Valuation and Delivery Insights for the CVD System

Order completion for the CVD System is expedited to align with project timelines, with typical delivery periods varying by configuration and procedural requirements. International and domestic clients can expect delivered systems within agreed lead times, inclusive of installation and commissioning support. Sample units are available upon interest and main export markets include North America, Europe, and Asia. Clients benefit from thorough valuation, transparent order tracking, and reliable delivery to their selected destination.

FAQs of Chemical Vapour Deposition System (CVD):

Q: How does the CVD system manage process safety during operation?

A: The CVD system integrates emergency shutoff mechanisms, over-temperature protection, and safety interlocks, ensuring safe operation and automatic response to any process deviations.

Q: What applications is the Chemical Vapour Deposition System best suited for?

A: It is most effective in thin film deposition, nanomaterial synthesis, semiconductor device fabrication, and research & development requiring precise surface engineering.

Q: Where can the CVD system be installed and commissioned?

A: On-site installation and commissioning are provided, with the system suited for use in research facilities, manufacturing plants, and academic laboratories.

Q: When can clients expect delivery of this CVD equipment after placing an order?

A: Delivery times depend on configuration but generally fall within standard industrial lead times, with expedited options available upon request.

Q: What process gases are compatible with the CVD system?

A: The system supports argon (Ar), nitrogen (N2), hydrogen (H2), oxygen (O2), methane (CH4), silane (SiH4), and other gases tailored to specific process requirements.

Q: How does the heating element contribute to the CVD process?

A: Kanthal or SiC heating elements deliver precise, uniform temperatures from ambient up to 1200C, ensuring consistent reaction chamber conditions for optimal deposition results.

Q: What are the benefits of data acquisition via USB or PC interface in this system?

A: Data acquisition through USB or PC interface allows effortless tracking, automated documentation, and seamless integration with analytical software for enhanced process control and research efficiency.